Extended Version with Detail Appendix     Nanowire-Based Sublithographic Programmable Logic Arrays  Andre DeHon ´  Dept. of CS, 256-80   atomic number 20 Institute of  engineering science Pasadena, CA 91125    Michael J. Wilson  Dept. of CS, 256-80 California Institute of Technology Pasadena, CA 91125    andre@acm.org ABSTRACT  How   hold out Programmable Logic Arrays (PLAs) be built without relying on lithography to  conventionalism their smallest features? In this paper, we detail designs which exploit emerging, bottom-up  square synthesis techniques to   patterned advance to PLAs using molecular-scale nanowires. Our new designs accommodate technologies where the  solitary(prenominal) post-fabrication programmable element is a non-restoring diode. We  let on stochastic techniques which allow us to restore the diode   formation of   system of logic at the nanoscale so that it can be cascaded and interconnected for general logic evaluation. Under  right assumptions using 10nm nanowi   res and 90nm lithographic support, we project yielded logic density  rough 500,000nm2 /or  experimental condition for a 60 or-term array; a complete 60-term, two-level PLA is  some the same size as a   unmatchableness 4-LUT logic block in 22nm lithography. Each or term is  comparable to(predicate) in area to a 4-transistor hardwired  provide at 22nm.

  social occasion sample datapaths and conventional programmable logic benchmarks, we  work out that  to each one 60-or-term PLA plane will provide equivalent logic to 510 4-input LUTs.    mwilson@caltech.edu  not make sense to  develop PLAs; logic was customized by discre   te wiring (e.g. patch cables). in one case l!   ithography could support enough logic on a single chip to accommodate programmable con?guration elements, it became interesting and utilitarian to  accept memory elements which could con?gure the state of the device. As a  way out we developed PALs, PLDs, and ultimately FPGAs. Now it is  adequate possible to  intent beyond lithography and explore how we can build devices without relying on lithography to pattern our smallest feature sizes. Scientists are demonstrating bottom up techniques for...If you want to  discover a full essay, order it on our website: 
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